SiGe电子结构的原子有序效应

Yen-Tien Tung, E. Chen, T. Shen, Y. Okuno, Chung-Cheng Wu, Jeff Wu, Carlos H. Díaz
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摘要

本文采用一个真实的原子模型,研究了Si0.5Ge0.5的原子有序效应对电子结构的影响。本文选择混合密度泛函理论(HSE06)作为研究方法。本文首先用实验数据和经验赝势法(EPM)计算验证了Si和Ge在不同对称点处的带隙和有效质量。对两种不同Si0.5Ge0.5原子构型的研究表明,sii - gege结构比SiGe-SiGe (RS2结构)更稳定。此外,前者的电子有效质量比后者的电子有效质量大,而且用虚晶体近似(VCA)计算的电子有效质量也比后者大。这种大的电子有效质量归因于ssi - gege情况下最低反键态的局域电子轨道,从而导致平坦的E-k曲线。但对空穴有效质量没有明显的排序效应。
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Atomic ordering effect on SiGe electronic structure
In this paper, a realistic atomic model is used to study the atomic ordering effect on electronic structures of Si0.5Ge0.5. The hybrid density functional theory (DFT), HSE06, is chosen as the methodology. The calculated bandgap and effective masses of Si and Ge at various symmetry points are first validated by the reported experimental data and empirical pseudo-potential method (EPM) calculations. The study of two different Si0.5Ge0.5 atomic configurations shows that the SiSi-GeGe case is more stable than SiGe-SiGe (RS2 structure). In addition, the electron effective masses of the former one are larger than those of the latter one, and those calculated by EPM with virtual crystal approximation (VCA). This large electron effective mass is attributed to the localized electron orbital of the lowest anti-bonding state in the SiSi-GeGe case which leads to a flat E-k curve. However, no obvious ordering effect on hole effective mass is found.
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