K. Indykiewicz, B. Paszkiewicz, T. Szymański, R. Paszkiewicz
{"title":"EBL双步曝光法制作蘑菇样型材的发展问题","authors":"K. Indykiewicz, B. Paszkiewicz, T. Szymański, R. Paszkiewicz","doi":"10.1109/ASDAM.2014.6998645","DOIUrl":null,"url":null,"abstract":"In the paper simple estimation method of development influence on final structures resolution in resist stack is proposed. The importance of analysis of development process in electron beam lithography is shown. Presented issues are enhancements of Monte Carlo simulations of e-beam influence on resists and as coupled calculations should be used in lithography process design. Performed analysis found good confirmations with conducted experiments.","PeriodicalId":313866,"journal":{"name":"The Tenth International Conference on Advanced Semiconductor Devices and Microsystems","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2014-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Development issue in mushroom-like profile fabrication in EBL double step exposure method\",\"authors\":\"K. Indykiewicz, B. Paszkiewicz, T. Szymański, R. Paszkiewicz\",\"doi\":\"10.1109/ASDAM.2014.6998645\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the paper simple estimation method of development influence on final structures resolution in resist stack is proposed. The importance of analysis of development process in electron beam lithography is shown. Presented issues are enhancements of Monte Carlo simulations of e-beam influence on resists and as coupled calculations should be used in lithography process design. Performed analysis found good confirmations with conducted experiments.\",\"PeriodicalId\":313866,\"journal\":{\"name\":\"The Tenth International Conference on Advanced Semiconductor Devices and Microsystems\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-12-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Tenth International Conference on Advanced Semiconductor Devices and Microsystems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASDAM.2014.6998645\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Tenth International Conference on Advanced Semiconductor Devices and Microsystems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM.2014.6998645","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Development issue in mushroom-like profile fabrication in EBL double step exposure method
In the paper simple estimation method of development influence on final structures resolution in resist stack is proposed. The importance of analysis of development process in electron beam lithography is shown. Presented issues are enhancements of Monte Carlo simulations of e-beam influence on resists and as coupled calculations should be used in lithography process design. Performed analysis found good confirmations with conducted experiments.
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