半导体器件击穿及钝化端接对接口的影响

V. Obreja, A. Obreja
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引用次数: 1

摘要

对于许多可用的商用半导体器件,由于存在故障风险,不允许在击穿区域运行。对于特殊设备,允许在特定条件下操作。介绍并分析了典型器件的反电特性,包括击穿区。在室温至150°C的特殊器件中,由于载流子雪崩倍增,电流在体中流动引起击穿区域。尽管如此,在150°C以上,由于钝化终端在界面处的高泄漏电流,在雪崩总体击穿达到之前,设备可能会发生故障。对于其他器件,即使在较低的温度下,界面处的电流过大也是达到雪崩体击穿的限制。
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Breakdown of semiconductor devices and influence of the interface from passivated termination
For many available commercial semiconductor devices, operation in the breakdown region is not allowed because of risk of failure. For specialized devices operation is permitted in specified conditions. Reverse electrical characteristics including the breakdown region for typical devices are presented and analyzed. A breakdown region caused by current flow in the bulk, due to carrier avalanche multiplication is exhibited for specialized devices from room temperature up to 150 °C. Nonetheless above 150 °C because of high level of leakage current flow at the interface from passivated termination, device failure may take place before the avalanche bulk breakdown is reached. For other devices even at lower temperature, excessive flow of current at the interface is a limitation to reach the avalanche bulk breakdown.
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