参数良率改进的设计时体偏置选择

Cheng Zhuo, Yung-Hsu Chang, D. Sylvester, D. Blaauw
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引用次数: 9

摘要

采用大规模技术设计的电路面临着严格的功率限制和不断增加的工艺可变性。实现高参数良率是一个关键的设计目标,但由于功率和性能之间的相关性而变得复杂。本文提出了一种新的设计时体偏置选择框架,用于在降低试验成本的同时优化参数良率。该框架考虑了模具内部和模具内部的变化以及功率性能的相关性。该方法使用特征提取技术来探索门之间的潜在相似性,以实现有效的聚类。一旦栅极被聚类,一个基于高斯正交的模型被应用于快速良率分析和优化。本文还引入了统计功率计算的增量方法,进一步降低了优化复杂度。所提出的框架将11个基准电路的参数产率平均从39%提高到80%,而运行时间与电路尺寸呈线性关系,对于高达15K门的设计,运行时间约为分钟。
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Design time body bias selection for parametric yield improvement
Circuits designed in aggressively scaled technologies face both stringent power constraints and increased process variability. Achieving high parametric yield is a key design objective, but is complicated by the correlation between power and performance. This paper proposes a novel design time body bias selection framework for parametric yield optimization while reducing testing costs. The framework considers both inter- and intra-die variations as well as power-performance correlations. This approach uses a feature extraction technique to explore the underlying similarity between the gates for effective clustering. Once the gates are clustered, a Gaussian quadrature based model is applied for fast yield analysis and optimization. This work also introduces an incremental method for statistical power computation to further reduce the optimization complexity. The proposed framework improves parametric yield from 39% to 80% on average for 11 benchmark circuits while runtime is linear with circuit size and on the order of minutes for designs with up to 15K gates.
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