基于电热模拟的CMOS电路寿命评估

M. Garci, J. Kammerer, L. Hébrard
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引用次数: 1

摘要

本文提出了考虑热载流子效应的MOSFET电热紧凑模型。这个新的紧凑模型评估了由热载流子产生的Si/SiO2界面态密度增加所引起的阈值电压位移和迁移率降低。这种物理效应取决于偏置条件和器件的温度。给出了在单晶体管上得到的结果,并与实验结果进行了比较。通过一个专门用于有效老化评估的电路,给出了芯片级的电热模拟。仿真结果清楚地显示了温度如何降低电路的寿命。这种新的电热紧凑模型与我们的电热仿真工具相结合,提供了评估模拟CMOS电路寿命的可能性。
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Lifetime of CMOS circuits evaluation by means of electro-thermal simulations
An electro-thermal compact model of MOSFET which takes the hot carriers effects into account is presented in this paper. This new compact model evaluates the threshold voltage shift as well as the mobility reduction induced by the increase of the density of states at the Si/SiO2 interface produced by hot carriers. This physical effect depends on the biasing conditions and the temperature of the device. Results obtained on a single transistor are presented and compared to experimental results. Electro-thermal simulations at chip level are presented through a circuit dedicated to effective aging evaluation. Simulation results clearly show how the temperature reduces the lifetime of circuits. This new electro-thermal compact model coupled to our electro-thermal simulation tool offers the possibility to evaluate the lifetime of analog CMOS circuit.
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