无晶圆计量创造就业机会

T. Harris, M.G. Ridens, B.P. Singh, E. Baaklini
{"title":"无晶圆计量创造就业机会","authors":"T. Harris, M.G. Ridens, B.P. Singh, E. Baaklini","doi":"10.1109/ASMC.1995.484340","DOIUrl":null,"url":null,"abstract":"Summary form only given, as follows. Discusses waferless job creation, which need not wait for wafer processing and therefore permits elimination of metrology associate delays during new product introduction. At Motorola's MOS-12 facility, implementation of waferless job creation on CD, overlay, and film thickness measurement tools has reduced new product introduction time by 2 days. In addition, because of standardization of metrology structures, there is much greater consistency in measurements across multiple products. The key components for successfully achieving waferless set up of metrology jobs are standardizing metrology in scribe structures, incorporating specialized inscribe pattern recognition features, tightly matching machines, and directly manipulating job plans. By having standard CAD libraries for each type of measurement the coordinates of all measurement features are known. By using optimized in scribe pattern recognition features, target images can be reused on new products. Tight matching of machines permits job plans written on one machine to be copied to all similar machines without modification. Direct manipulation of job plans eliminates the need for a wafer during job creation.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Waferless metrology job creation\",\"authors\":\"T. Harris, M.G. Ridens, B.P. Singh, E. Baaklini\",\"doi\":\"10.1109/ASMC.1995.484340\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given, as follows. Discusses waferless job creation, which need not wait for wafer processing and therefore permits elimination of metrology associate delays during new product introduction. At Motorola's MOS-12 facility, implementation of waferless job creation on CD, overlay, and film thickness measurement tools has reduced new product introduction time by 2 days. In addition, because of standardization of metrology structures, there is much greater consistency in measurements across multiple products. The key components for successfully achieving waferless set up of metrology jobs are standardizing metrology in scribe structures, incorporating specialized inscribe pattern recognition features, tightly matching machines, and directly manipulating job plans. By having standard CAD libraries for each type of measurement the coordinates of all measurement features are known. By using optimized in scribe pattern recognition features, target images can be reused on new products. Tight matching of machines permits job plans written on one machine to be copied to all similar machines without modification. Direct manipulation of job plans eliminates the need for a wafer during job creation.\",\"PeriodicalId\":237741,\"journal\":{\"name\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1995.484340\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1995.484340","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

仅给出摘要形式,如下。讨论无晶圆片创造就业机会,无需等待晶圆片处理,因此可以消除新产品引入期间的计量相关延迟。在摩托罗拉的MOS-12工厂,在CD、覆盖层和薄膜厚度测量工具上的无晶圆就业机会的实施将新产品的推出时间缩短了2天。此外,由于计量结构的标准化,在多个产品之间的测量具有更大的一致性。成功实现无晶圆计量作业的关键组件是标准化的计量结构,结合专门的刻字模式识别功能,紧密匹配的机器,并直接操纵作业计划。通过为每种类型的测量提供标准CAD库,所有测量特征的坐标都是已知的。通过优化的in - scribe模式识别特征,目标图像可以在新产品上重复使用。机器的紧密匹配允许在一台机器上编写的作业计划不加修改地复制到所有类似的机器上。直接操作作业计划消除了在创造就业机会过程中对晶圆的需求。
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Waferless metrology job creation
Summary form only given, as follows. Discusses waferless job creation, which need not wait for wafer processing and therefore permits elimination of metrology associate delays during new product introduction. At Motorola's MOS-12 facility, implementation of waferless job creation on CD, overlay, and film thickness measurement tools has reduced new product introduction time by 2 days. In addition, because of standardization of metrology structures, there is much greater consistency in measurements across multiple products. The key components for successfully achieving waferless set up of metrology jobs are standardizing metrology in scribe structures, incorporating specialized inscribe pattern recognition features, tightly matching machines, and directly manipulating job plans. By having standard CAD libraries for each type of measurement the coordinates of all measurement features are known. By using optimized in scribe pattern recognition features, target images can be reused on new products. Tight matching of machines permits job plans written on one machine to be copied to all similar machines without modification. Direct manipulation of job plans eliminates the need for a wafer during job creation.
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