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摘要

二维晶体的兴起给器件研究带来了新的挑战和机遇。半导体二硫化钼为n通道,磷烯为p通道,被认为是未来微电子和光电子器件中有前途的超薄体通道。在本文中,我们关注这些二维晶体管的基本器件特性。在本文的第一部分中,我们展示了通过分子化学掺杂1,2二氯乙烷(DCE)实现的高性能MoS2 fet,其漏极电流达到了创纪录的460 mA/mm,接触电阻达到了创纪录的0.5 Ω·mm。本文第二部分介绍了一种新的p型二维材料磷烯,它是一种单层的层状黑磷(BP)。在室温下,通道长度为1.0 μm的少层磷二烯场效应晶体管的通流可达194 mA/mm,空穴场效应迁移率可达286 cm2/V·s,通断比可达104。我们通过构建第一个由磷二烯PMOS和MoS2 NMOS晶体管组成的二维CMOS逆变器和第一个用于光子应用的BP/MoS2 PN二极管,证明了磷二烯集成的可能性。
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Device Perspective on 2D Materials
The rise of two-dimensional (2D) crystals has given new challenges and opportunities to the device research. The semiconducting MoS2 as n-channel and few-layer phosphorene as p-channel have been considered as promising ultra-thin body channels for future microelectronic and optoelectronic devices. In this paper, we focus on the fundamental device properties of these 2D transistors. In the first part of the paper, we demonstrate high-performance MoS2 FETs with record drain current of 460 mA/mm and record low contact resistance of 0.5 Ω·mm enabled by molecular chemical doping of 1,2 dichloroethane (DCE). In the second part of the paper, we introduce a new p-type 2D material called phosphorene which is one monolayer of layered black phosphorus (BP). At room temperature, the few-layer phosphorene field-effect transistors with 1.0 μm channel length display a high on-current of 194 mA/mm, a high hole field-effect mobility of 286 cm2/V·s, and an on/off ratio up to 104. We demonstrate the possibility of phosphorene integration by constructing the first 2D CMOS inverter of phosphorene PMOS and MoS2 NMOS transistors and the first BP/MoS2 PN diode for photonic applications.
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