VLSI器件中的金硅纤维短管

R. E. Lund
{"title":"VLSI器件中的金硅纤维短管","authors":"R. E. Lund","doi":"10.1109/RELPHY.1988.23430","DOIUrl":null,"url":null,"abstract":"An analysis and documentation method used to expose fibrous gold-silicon particle shorts was developed. The particles are a consequence of the die bond scrub-in being performed in an oxidizing atmosphere. Initially attached to the substrate, the fibers become detached during vibration or temperature cycling and cause intermittent shorts. It is shown that this particle generating tendency can be eliminated by using an adequate amount of cover gas concentration, which eliminates oxidation of the silicon. The bonding pressure, amplitude, duration, and temperature are other process parameters requiring optimization.<<ETX>>","PeriodicalId":102187,"journal":{"name":"26th Annual Proceedings Reliability Physics Symposium 1988","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Gold-silicon fiber shorts in VLSI devices\",\"authors\":\"R. E. Lund\",\"doi\":\"10.1109/RELPHY.1988.23430\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An analysis and documentation method used to expose fibrous gold-silicon particle shorts was developed. The particles are a consequence of the die bond scrub-in being performed in an oxidizing atmosphere. Initially attached to the substrate, the fibers become detached during vibration or temperature cycling and cause intermittent shorts. It is shown that this particle generating tendency can be eliminated by using an adequate amount of cover gas concentration, which eliminates oxidation of the silicon. The bonding pressure, amplitude, duration, and temperature are other process parameters requiring optimization.<<ETX>>\",\"PeriodicalId\":102187,\"journal\":{\"name\":\"26th Annual Proceedings Reliability Physics Symposium 1988\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-04-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"26th Annual Proceedings Reliability Physics Symposium 1988\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.1988.23430\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"26th Annual Proceedings Reliability Physics Symposium 1988","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1988.23430","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

提出了一种用于暴露纤维状金硅颗粒短板的分析和记录方法。这些颗粒是在氧化气氛中进行模键洗涤的结果。纤维最初附着在基材上,在振动或温度循环过程中脱落,导致间歇性短路。结果表明,使用适量的覆盖气体浓度可以消除硅的氧化,从而消除颗粒的生成趋势。粘接压力、振幅、持续时间和温度是其他需要优化的工艺参数
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Gold-silicon fiber shorts in VLSI devices
An analysis and documentation method used to expose fibrous gold-silicon particle shorts was developed. The particles are a consequence of the die bond scrub-in being performed in an oxidizing atmosphere. Initially attached to the substrate, the fibers become detached during vibration or temperature cycling and cause intermittent shorts. It is shown that this particle generating tendency can be eliminated by using an adequate amount of cover gas concentration, which eliminates oxidation of the silicon. The bonding pressure, amplitude, duration, and temperature are other process parameters requiring optimization.<>
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