{"title":"过滤等离子体通量的真空弧膜沉积装置","authors":"V. Khoroshikh, S. A. Leonov, V. A. Belous","doi":"10.1109/DEIV.2000.879051","DOIUrl":null,"url":null,"abstract":"An installation for vacuum-arc droplet-free film deposition was designed. It contains two rectilinear plasma sources, in whose cylindrical anodes the disk filtering shields are placed. The investigated variant of installation provides ion current at a level 2.4 A at a current of the arc in each of plasma sources 100 A. The deposition rate of 5 /spl mu/m/h for titanium nitride films was achieved over the rotating cylindrical detail of height 50 mm and diameter of 45 mm. It is shown also that the installation allows to receive coatings by thickness up to 3 microns at the average size of microroughnesses on its surface about 0.08-0.09 microns.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Installation for vacuum-arc film deposition by filtered plasma fluxes\",\"authors\":\"V. Khoroshikh, S. A. Leonov, V. A. Belous\",\"doi\":\"10.1109/DEIV.2000.879051\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An installation for vacuum-arc droplet-free film deposition was designed. It contains two rectilinear plasma sources, in whose cylindrical anodes the disk filtering shields are placed. The investigated variant of installation provides ion current at a level 2.4 A at a current of the arc in each of plasma sources 100 A. The deposition rate of 5 /spl mu/m/h for titanium nitride films was achieved over the rotating cylindrical detail of height 50 mm and diameter of 45 mm. It is shown also that the installation allows to receive coatings by thickness up to 3 microns at the average size of microroughnesses on its surface about 0.08-0.09 microns.\",\"PeriodicalId\":429452,\"journal\":{\"name\":\"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DEIV.2000.879051\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2000.879051","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Installation for vacuum-arc film deposition by filtered plasma fluxes
An installation for vacuum-arc droplet-free film deposition was designed. It contains two rectilinear plasma sources, in whose cylindrical anodes the disk filtering shields are placed. The investigated variant of installation provides ion current at a level 2.4 A at a current of the arc in each of plasma sources 100 A. The deposition rate of 5 /spl mu/m/h for titanium nitride films was achieved over the rotating cylindrical detail of height 50 mm and diameter of 45 mm. It is shown also that the installation allows to receive coatings by thickness up to 3 microns at the average size of microroughnesses on its surface about 0.08-0.09 microns.
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