hemt中氮化和砷化通道热声子效应的比较分析

A. Matulionis
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引用次数: 4

摘要

晶体管的截止频率主要由栅极长度和电子漂移速度决定。一般来说,在二维电子气通道(2DEG)中,速度达到很高的值。因此,具有2度通道的高电子迁移率晶体管(HEMT)可以在对应于短毫米波的频率下工作。虽然电子在氮化和砷化2DEG通道中的漂移速度最大值相似,但与氮化HEMT相比,砷化HEMT的频率性能更好。然而,为什么热声子不限制砷化物2DEG通道中的漂移速度并不是直接的,在本文中,对AlInAs/GaInAs/AlInAs/InP, AlGaN/GaN和AlGaN/AlN/GaN通道中的热声子效应进行了比较分析。
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Comparative analysis of hot-phonon effects in nitride and arsenide channels for HEMTs
The cutoff frequency of a transistor is determined mainly by gate length and electron drift velocity. In general, the velocity reaches high values in a two-dimensional electron gas channel (2DEG). Thus, a high electron mobility transistor (HEMT) with a 2DEG channel can operate at frequencies corresponding to short millimeter waves. Though the highest values of drift velocity are similar for electrons in nitride and arsenide 2DEG channels, the frequency performance of an arsenide HEMT is superior, as compared with nitride HEMTs. However, it is not straightforward to see why hot phonons do not limit drift velocity in arsenide 2DEG channels and, in this paper, a comparative analysis of hot-phonon effects in AlInAs/GaInAs/AlInAs/InP, AlGaN/GaN and AlGaN/AlN/GaN channels is carried out.
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