结构几何形状和体积陷阱对InAlN/GaN HEMT开关瞬态的影响

J. Marek, A. Šatka, D. Donoval, M. Molnar, J. Priesol, A. Chvála, P. Pribytny
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引用次数: 1

摘要

利用二维Sentaurus TCAD仿真工具研究了n++GaN/InAlN/AlN/GaN高电子迁移率晶体管(HEMT)结构几何形状和体阱对其性能的影响。通过在实际设备上标定的电物理模型进行了仿真。结果表明,受体陷阱和施主陷阱对器件开关特性都有显著影响。
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Influence of structure geometry and bulk traps on switching transients of InAlN/GaN HEMT
Impact of structure geometry and bulk traps on the performance of the n++GaN/InAlN/AlN/GaN high electron mobility transistor (HEMT) using two-dimensional Sentaurus TCAD simulation tool were investigated. Simulations were performed by the electrophysical models calibrated on real devices. The results indicate a significant influence of both acceptor and donor traps on device switching characteristics.
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