Sensitivity analysis and fine tuning of EM simulation for CPW transmission line characterization

This paper addresses the issue of thin-film characterization through wafer-probe measurements and electromagnetic simulation (EM simulation). The parameters are optimized to get the best fit between measured and simulated S-parameters. Based on the results obtained an optimization methodology for modeling the test structure is presented. The optimization methodology has been verified by investigating the S-parameters of Coplanar-Waveguide (CPW) transmission lines with a known SiO2 layer using CAD simulations and two-port S-parameter measurements up to 6 GHz. The combination of CAD simulation and S-parameter measurement is shown to be suitable for characterization of dielectric materials.