瞬态双界面测量-一种新的JEDEC标准,用于测量结壳热阻

D. Schweitzer, H. Pape, Liu Chen, R. Kutscherauer, Martin Walder
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引用次数: 49

摘要

结壳热阻Rth-JC是功率半导体器件的重要热特性。它的值通常是决定器件是否可以在热要求苛刻的环境中使用的主要标准之一,因此低Rth-JC对半导体制造商来说是一种竞争优势。另一方面,供应商必须确保他们的数据表值不会低估实际的Rth-JC值。因此,需要精确和可重复的方法来测量Rth-JC。不幸的是,这些要求并不容易满足,这反映在直到最近才存在JEDEC确定该热度量的行业标准这一事实。在过去的三年中,我们对具有单一热流路径的功率半导体封装的rh - jc进行了密集测试并进一步开发了一种新的瞬态测量方法。所谓的瞬态双界面测量(TDIM),可以测量Rth-JC比传统方法具有更高的精度和更好的再现性,现在已被接受为JEDEC标准JESD51-14。
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Transient dual interface measurement — A new JEDEC standard for the measurement of the junction-to-case thermal resistance
The junction-to-case thermal resistance Rth-JC is an important thermal characteristic for power semiconductor devices. Its value is often one of the main criteria for the decision whether a device can be used in a thermally demanding environment, and a low Rth-JC therefore is a competitive advantage for the semiconductor manufacturer. On the other hand the vendors must ensure that their data-sheet values do not underestimate the actual Rth-JC values. Hence accurate and reproducible methods to measure the Rth-JC are required. Unfortunately these requirements are not easy to meet, which is reflected by the fact that until very recently there existed no JEDEC industry standard for the determination of this thermal metric. During the last three years we have intensely tested and further developed a new transient measurement method for the Rth-JC of power semiconductor packages with a single heat flow path. The so called transient dual interface measurement (TDIM) which allows measuring the Rth-JC with higher accuracy and better reproducibility than traditional methods has now been accepted as JEDEC standard JESD51–14.
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