低电压,高性能的InAs/AlSb hemt,在100 mV漏极偏压下功率增益高于100 GHz

J. Bergman, G. Nagy, G. Sullivan, A. Ikhlassi, B. Brar
{"title":"低电压,高性能的InAs/AlSb hemt,在100 mV漏极偏压下功率增益高于100 GHz","authors":"J. Bergman, G. Nagy, G. Sullivan, A. Ikhlassi, B. Brar","doi":"10.1109/DRC.2004.1367888","DOIUrl":null,"url":null,"abstract":"Ultra-low power circuits require transistors with usable RF gain at low bias voltages and currents. In the present paper, we report 100 nm gate-length InAs/AlSb HEMTs with f/sub /spl tau// and f/sub max/ both exceeding 100 GHz at a mere 100 mV of drain bias. The devices also show excellent peak value for f/sub /spl tau// of 235 GHz and, to the best of our knowledge, a record f/sub max/ of 235 GHz at a higher drain bias of 300 mV.","PeriodicalId":385948,"journal":{"name":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":"{\"title\":\"Low-voltage, high-performance InAs/AlSb HEMTs with power gain above 100 GHz at 100 mV drain bias\",\"authors\":\"J. Bergman, G. Nagy, G. Sullivan, A. Ikhlassi, B. Brar\",\"doi\":\"10.1109/DRC.2004.1367888\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ultra-low power circuits require transistors with usable RF gain at low bias voltages and currents. In the present paper, we report 100 nm gate-length InAs/AlSb HEMTs with f/sub /spl tau// and f/sub max/ both exceeding 100 GHz at a mere 100 mV of drain bias. The devices also show excellent peak value for f/sub /spl tau// of 235 GHz and, to the best of our knowledge, a record f/sub max/ of 235 GHz at a higher drain bias of 300 mV.\",\"PeriodicalId\":385948,\"journal\":{\"name\":\"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.\",\"volume\":\"25 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"25\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.2004.1367888\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2004.1367888","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 25

摘要

超低功耗电路要求晶体管在低偏置电压和电流下具有可用的射频增益。在本文中,我们报道了100 nm栅极长度的InAs/AlSb HEMTs,其f/sub /spl tau//和f/sub max/ /在仅100 mV的漏极偏置下均超过100 GHz。该器件还显示出235 GHz的f/sub /spl tau//峰值,并且据我们所知,在300 mV的更高漏极偏置下,f/sub max/ /记录为235 GHz。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Low-voltage, high-performance InAs/AlSb HEMTs with power gain above 100 GHz at 100 mV drain bias
Ultra-low power circuits require transistors with usable RF gain at low bias voltages and currents. In the present paper, we report 100 nm gate-length InAs/AlSb HEMTs with f/sub /spl tau// and f/sub max/ both exceeding 100 GHz at a mere 100 mV of drain bias. The devices also show excellent peak value for f/sub /spl tau// of 235 GHz and, to the best of our knowledge, a record f/sub max/ of 235 GHz at a higher drain bias of 300 mV.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Complex band structure-based non-equilibrium Green's function (NEGF) transport studies for ultra-scaled carbon nanotube (CNT) transistors [CNTFETs] Nano-scale MOSFETs with programmable virtual source/drain High power AlGaN/GaN heterojunction FETs for base station applications Physical limits on binary logic switch scaling Directly lithographic top contacts for pentacene organic thin-film transistors
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1