真空电弧中无冲击等离子体流动的电流上限

E. Gidalevich, S. Goldsmith, R. Boxman
{"title":"真空电弧中无冲击等离子体流动的电流上限","authors":"E. Gidalevich, S. Goldsmith, R. Boxman","doi":"10.1109/DEIV.2000.877302","DOIUrl":null,"url":null,"abstract":"The cathode plasma jet deceleration caused by interaction with a secondary ion cushion at the anode is analyzed. The secondary ions are assumed to be sputtered or/and reflected from the copper anode. It was found that for an inter-electrode gap of L=2 cm, and a secondary ion velocity of 10/sup 3/ m/s, there is no upper limit for the current density for continuous jet motion. For secondary ion velocities <0.25/spl times/10/sup 3/ m/s, the upper limit is 10/sup 5/ A/m/sup 2/.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"An upper limit for the electric current for shock-free plasma flow in a vacuum arc\",\"authors\":\"E. Gidalevich, S. Goldsmith, R. Boxman\",\"doi\":\"10.1109/DEIV.2000.877302\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The cathode plasma jet deceleration caused by interaction with a secondary ion cushion at the anode is analyzed. The secondary ions are assumed to be sputtered or/and reflected from the copper anode. It was found that for an inter-electrode gap of L=2 cm, and a secondary ion velocity of 10/sup 3/ m/s, there is no upper limit for the current density for continuous jet motion. For secondary ion velocities <0.25/spl times/10/sup 3/ m/s, the upper limit is 10/sup 5/ A/m/sup 2/.\",\"PeriodicalId\":429452,\"journal\":{\"name\":\"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DEIV.2000.877302\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2000.877302","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

分析了阴极等离子体与阳极二次离子缓冲层相互作用引起的射流减速现象。二次离子被认为是从铜阳极溅射或/和反射的。结果表明,当电极间隙L=2 cm,二次离子速度为10/sup / m/s时,连续射流的电流密度没有上限。二次离子速度<0.25/spl次/10/sup 3/ m/s,上限为10/sup 5/ A/m/sup 2/。
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An upper limit for the electric current for shock-free plasma flow in a vacuum arc
The cathode plasma jet deceleration caused by interaction with a secondary ion cushion at the anode is analyzed. The secondary ions are assumed to be sputtered or/and reflected from the copper anode. It was found that for an inter-electrode gap of L=2 cm, and a secondary ion velocity of 10/sup 3/ m/s, there is no upper limit for the current density for continuous jet motion. For secondary ion velocities <0.25/spl times/10/sup 3/ m/s, the upper limit is 10/sup 5/ A/m/sup 2/.
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