深紫外传感器使用表面声波振荡器制造的单晶AlN薄膜生长在蓝宝石衬底

C. P. Laksana, Meei-Ru Chen, H. Kao, E. Jeng, S. Jian
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引用次数: 0

摘要

在450℃的生长温度下,利用螺旋溅射系统在(001)蓝宝石衬底上制备了外延单晶AlN薄膜。在AlN/蓝宝石上制备了表面声波滤波器。中心频率为354.2MHz,对应相速度为5667 m/s。插入损耗和旁瓣抑制分别约为24.9dB和11.4dB。在薄膜厚度为0.4µm和1µm时,TCF值分别为- 74.9 ppm/°C和- 65.76 ppm/°C。AlN/蓝宝石的频率温度系数(TCF)与薄膜厚度成正比。当波长为200nm左右、功率密度为12mw /cm2的紫外光源照射SAW器件表面时,观察到频率下降约43 KHz。
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Deep UV sensors using surface acoustic wave oscillators fabricated on single crystalline AlN films grown on sapphire substrates
Epitaxial single crystal AlN thin films have been obtained on (001) sapphire substrates by helicon sputtering system at growth temperature of 450°C. Surface acoustic wave (SAW) filters were fabricated on AlN/sapphire. The center frequency is 354.2MHz, which corresponds to a phase velocity of 5667 m/s. The insertion loss and sidelobe rejection were about 24.9dB and 11.4dB, respectively. The value of TCF is measured to be −74.9 ppm/°C and −65.76 ppm/°C at 0.4 µm and 1 µm of film thickness, respectively. The temperature coefficient of frequency (TCF) of AlN/sapphire shows proportional to the film thickness. A frequency downshift about 43 KHz was observed when the UV source with the wavelength of around 200nm and 12 mW/cm2 of power density radiates the surface of SAW devices.
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