热靶反应磁控溅射法制备tio2 /sub - 2掺杂层的结构和电子性能研究

The Fourth International Conference on Advanced Semiconductor Devices and Microsystem Pub Date : 2002-12-16 DOI:10.1109/ASDAM.2002.1088472

E. Prociów, J. Domaradzki, D. Kaczmarck

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引用次数: 4

摘要

本文描述了掺杂钯和金的钛氧化物的结构和热电性能，并在掺杂钯的样品中发现了热电效应。讨论了钛膜在沉积过程中的生长和成核。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Investigations of structural and electronic properties of TiO/sub 2/-doped layers deposited by hot target reactive magnetron sputtering method

In the paper structural and thermoelectrical properties of titanium oxides with palladium and gold dopants has been described The thermoelectric effect in the specimen doped by palladium has been found. Growing and nucleation of titanium films during deposition has been also discussed.

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The Fourth International Conference on Advanced Semiconductor Devices and Microsystem

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