CMOS-MEMS红外发射阵列的设计

Zhengxi Cheng, H. Toshiyoshi
{"title":"CMOS-MEMS红外发射阵列的设计","authors":"Zhengxi Cheng, H. Toshiyoshi","doi":"10.1109/NEMS.2016.7758284","DOIUrl":null,"url":null,"abstract":"This paper presents a new design of complementary metal-oxide-semiconductor-microelectromechanical systems (CMOS-MEMS) infrared emitter arrays integrated with metamaterial absorbers (MA). The infrared emitter array is a key IR thermal radiation source for gas sensors. The IR emitter arrays are implemented using the standard CSMC 0.5 μm 2P3M CMOS process. Three different shape of micro emitters are designed with 2 different thin film layers stacks, without and with metamaterial absorbers, for each shape. Micro structures are released from Si substrate through the post-CMOS dielectric dry etching and bulk silicon wet etching. Read-in circuit is also integrated with each 8×8 scale emitter array. Steady state thermal responses and dynamic thermal responses are simulated through multi-physics coupling finite element method (FEM), then radiation responses are calculated with a Matlab program based on thermal responses. Emissivity of emitters are also calculated through FEM simulation, which shows that the integration of metamaterial absorbers is an effective way to increases emissivity in both short and long infrared wavebands.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Design of CMOS-MEMS infrared emitter arrays\",\"authors\":\"Zhengxi Cheng, H. Toshiyoshi\",\"doi\":\"10.1109/NEMS.2016.7758284\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a new design of complementary metal-oxide-semiconductor-microelectromechanical systems (CMOS-MEMS) infrared emitter arrays integrated with metamaterial absorbers (MA). The infrared emitter array is a key IR thermal radiation source for gas sensors. The IR emitter arrays are implemented using the standard CSMC 0.5 μm 2P3M CMOS process. Three different shape of micro emitters are designed with 2 different thin film layers stacks, without and with metamaterial absorbers, for each shape. Micro structures are released from Si substrate through the post-CMOS dielectric dry etching and bulk silicon wet etching. Read-in circuit is also integrated with each 8×8 scale emitter array. Steady state thermal responses and dynamic thermal responses are simulated through multi-physics coupling finite element method (FEM), then radiation responses are calculated with a Matlab program based on thermal responses. Emissivity of emitters are also calculated through FEM simulation, which shows that the integration of metamaterial absorbers is an effective way to increases emissivity in both short and long infrared wavebands.\",\"PeriodicalId\":150449,\"journal\":{\"name\":\"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NEMS.2016.7758284\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NEMS.2016.7758284","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文提出了一种集成超材料吸收器的互补金属氧化物-半导体-微机电系统(CMOS-MEMS)红外发射阵列的新设计。红外发射阵列是气体传感器红外热辐射源的重要组成部分。红外发射器阵列采用标准CSMC 0.5 μm 2P3M CMOS工艺实现。设计了三种不同形状的微型发射器,每种形状都有2种不同的薄膜层堆叠,不带和带超材料吸收器。通过后cmos介质干刻蚀和体硅湿刻蚀,从硅衬底上释放出微观结构。读入电路也集成在每个8×8刻度发射极阵列上。采用多物理场耦合有限元法模拟了稳态热响应和动态热响应,并利用Matlab程序计算了基于热响应的辐射响应。通过有限元模拟计算了发射体的发射率,结果表明,超材料吸收体的集成是提高红外短波和长波发射率的有效途径。
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Design of CMOS-MEMS infrared emitter arrays
This paper presents a new design of complementary metal-oxide-semiconductor-microelectromechanical systems (CMOS-MEMS) infrared emitter arrays integrated with metamaterial absorbers (MA). The infrared emitter array is a key IR thermal radiation source for gas sensors. The IR emitter arrays are implemented using the standard CSMC 0.5 μm 2P3M CMOS process. Three different shape of micro emitters are designed with 2 different thin film layers stacks, without and with metamaterial absorbers, for each shape. Micro structures are released from Si substrate through the post-CMOS dielectric dry etching and bulk silicon wet etching. Read-in circuit is also integrated with each 8×8 scale emitter array. Steady state thermal responses and dynamic thermal responses are simulated through multi-physics coupling finite element method (FEM), then radiation responses are calculated with a Matlab program based on thermal responses. Emissivity of emitters are also calculated through FEM simulation, which shows that the integration of metamaterial absorbers is an effective way to increases emissivity in both short and long infrared wavebands.
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