Si, GaAs和InP二极管在X和Q波段性能的大信号计算

A. Vanoverschelde, G. Salmer
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引用次数: 0

摘要

研究了巴里特二极管在毫米波范围内的性能,以及电子速度对GaAs和InP中场依赖性的影响。通过精确的大信号模拟,分析了掺杂剖面和材料参数的影响。在毫米频率下,由于负电阻的小值,Si Baritt射频功率仍然有限。采用GaAs或inpn + pnn +结构可大大提高这种电阻;因此,可以期望更好的可用功率和效率。发现InP材料优于GaAs材料,因为其射频电平可以更高,扩散现象效应较小。
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Large Signal Calculations of Si, GaAs and InP Baritt Diode Performances in X and Q Band
The capabilities of Baritt diodes in the millimeter wave range and the effects of the electron velocity versus field dependence in GaAs and InP are investigated. The influences of doping profile and material parameters are analysed by means of an exact large signal simulation. At millimeter frequencies, the Si Baritt r.f. power remains limited due to the small value of the negative resistance. This resistance is greatly improved by using GaAs or InP N+P N N+ structures; thus, better available power and efficiency can be expected. The InP material is found to be better than GaAs, because the r.f. levels can be higher and the diffusion phenomenon effect is smaller.
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