S. D. Hossain, M. Paś, R. Cleavelin, R. Robinson, G. Miner, A. Nanda
{"title":"一个行业内、供应商和SEMATECH合作的模型,包括行业间的团队合作","authors":"S. D. Hossain, M. Paś, R. Cleavelin, R. Robinson, G. Miner, A. Nanda","doi":"10.1109/ASMC.1995.484392","DOIUrl":null,"url":null,"abstract":"A model is presented for an intra semiconductor user-equipment supplier-SEMATECH project effort. The on-going 0.25 /spl mu/m Source/Drain Rapid Thermal Process (S/D RTP) project is used as the basis for this model. The successful completion of this project supports the model's assertions. A methodological approach taken from the initial stages of a project to the completion generates valuable and valid data, provides a planned strategy, allows for timely allocation of resources, and results in a win-win situation for all involved. This model will be referred to as \"Model for Supplier/User Partnering\" or MSUP.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A model for intra industry, supplier, and SEMATECH collaboration including an inter-group effort by industry\",\"authors\":\"S. D. Hossain, M. Paś, R. Cleavelin, R. Robinson, G. Miner, A. Nanda\",\"doi\":\"10.1109/ASMC.1995.484392\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A model is presented for an intra semiconductor user-equipment supplier-SEMATECH project effort. The on-going 0.25 /spl mu/m Source/Drain Rapid Thermal Process (S/D RTP) project is used as the basis for this model. The successful completion of this project supports the model's assertions. A methodological approach taken from the initial stages of a project to the completion generates valuable and valid data, provides a planned strategy, allows for timely allocation of resources, and results in a win-win situation for all involved. This model will be referred to as \\\"Model for Supplier/User Partnering\\\" or MSUP.\",\"PeriodicalId\":237741,\"journal\":{\"name\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1995.484392\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1995.484392","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A model for intra industry, supplier, and SEMATECH collaboration including an inter-group effort by industry
A model is presented for an intra semiconductor user-equipment supplier-SEMATECH project effort. The on-going 0.25 /spl mu/m Source/Drain Rapid Thermal Process (S/D RTP) project is used as the basis for this model. The successful completion of this project supports the model's assertions. A methodological approach taken from the initial stages of a project to the completion generates valuable and valid data, provides a planned strategy, allows for timely allocation of resources, and results in a win-win situation for all involved. This model will be referred to as "Model for Supplier/User Partnering" or MSUP.