Cost-effective printed memristor fabrication and analysis

Fabrication of the printed memristors and their memristive behavior have been presented for different metal-insulator-metal (MIM) structures. The printing techniques studied for the current work includes electrohydrodynamic printing (EHDP) and roll-to-plate. The materials used for the electrode deposition are silver (Ag) and indium titanium oxide (ITO) while zirconium oxide (ZrO2) and graphene oxide (GO) have been used for the sandwich layer between two electrodes on a polyimide (PI) substrate. Electrically stable bipolar resistive switching behavior of all the MIM structures with significant Off/On ratio has been observed. The analysis regarding device dimensions and its current voltage (IV) behavior with respect to the employed printed electronic techniques confirms their feasibility for the cost-effective memristive device fabrication.