铕和钕掺杂TiO2基质的光致发光分析

A. Borkowska
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引用次数: 0

摘要

本文分析了铕和钕掺杂TiO2基质的光致发光效应。采用高能反应磁控溅射(HE RMS)法制备了金属Ti-Eu和Ti-Nd镶嵌靶,并在Si和SiO2表面沉积薄膜。沉积后,选择的薄膜在400℃和600℃的空气环境中进行额外退火。分析了光致发光(PL)和光透射测量的结果,并描述了它们与微观结构的关系。
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Analysis of photoluminescence in TiO2 matrix doped with Eu and Nd
This work presents the analysis of photoluminescence effect in TiO2 matrix doped with Eu and Nd. Thin films were prepared by high energy reactive magnetron sputtering (HE RMS) method using metallic Ti-Eu and Ti-Nd mosaic targets and deposited on Si and SiO2. After deposition selected films were additionally annealed in an air ambient at 400degC and 600degC. The results of photoluminescence (PL) and optical transmission measurements were analyzed and their correlation with microstructure was described.
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