铜再沉积QFN表面变色失效分析

S. Buenviaje
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引用次数: 0

摘要

QFN-mr的无磁带技术是后端制造的突破。然而,背蚀刻工艺有一些折衷。该站的表面变色是一个长期的缺陷。在本研究中,进行了工艺模拟和材料表征以确定根本原因。铜和硫的存在通过一种称为铜再沉积的现象与高浓度硫酸相关联。
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Failure Analysis of QFN Surface Discoloration by Copper Redeposition
Tapeless technology of QFN-mr has been a breakthrough in back-end manufacturing. However, back-etching process has some tradeoffs. Surface discoloration at this station has been a chronic defect. In this study, process simulations and material characterizations were performed to determine the root cause. Presence of copper and sulfur was correlated with the high concentration of sulfuric acid through a phenomenon called as copper redeposition.
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