Sihyun Kim, D. Kwon, Ryoongbin Lee, D. Kim, Byung-Gook Park
{"title":"MOSFET和基于tfet的ph敏感ISFET温度依赖性的仿真研究","authors":"Sihyun Kim, D. Kwon, Ryoongbin Lee, D. Kim, Byung-Gook Park","doi":"10.23919/SNW.2017.8242313","DOIUrl":null,"url":null,"abstract":"The temperature dependence of MOSFET and TFET-based pH sensitive ISFET was investigated through TCAD device simulation. The transfer characteristics and the pH sensitivities of both devices at various temperature were compared. TFET-based ISFET exhibits superior thermal stability in contrast with the MOSFET-based ISFET due to the difference of conduction mechanism.","PeriodicalId":424135,"journal":{"name":"2017 Silicon Nanoelectronics Workshop (SNW)","volume":"148 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Simulation study on temprature dependence of MOSFET and TFET-based pH-sensitive ISFET\",\"authors\":\"Sihyun Kim, D. Kwon, Ryoongbin Lee, D. Kim, Byung-Gook Park\",\"doi\":\"10.23919/SNW.2017.8242313\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The temperature dependence of MOSFET and TFET-based pH sensitive ISFET was investigated through TCAD device simulation. The transfer characteristics and the pH sensitivities of both devices at various temperature were compared. TFET-based ISFET exhibits superior thermal stability in contrast with the MOSFET-based ISFET due to the difference of conduction mechanism.\",\"PeriodicalId\":424135,\"journal\":{\"name\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"volume\":\"148 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/SNW.2017.8242313\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Silicon Nanoelectronics Workshop (SNW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SNW.2017.8242313","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Simulation study on temprature dependence of MOSFET and TFET-based pH-sensitive ISFET
The temperature dependence of MOSFET and TFET-based pH sensitive ISFET was investigated through TCAD device simulation. The transfer characteristics and the pH sensitivities of both devices at various temperature were compared. TFET-based ISFET exhibits superior thermal stability in contrast with the MOSFET-based ISFET due to the difference of conduction mechanism.