碳纳米管晶体管的优化设计和库仑阻塞抑制泄漏

K. Alam, R. Lake
{"title":"碳纳米管晶体管的优化设计和库仑阻塞抑制泄漏","authors":"K. Alam, R. Lake","doi":"10.1109/DRC.2005.1553106","DOIUrl":null,"url":null,"abstract":"We consider a 1.5 nm diameter (19,0) CNT for which zero-Schottky-barrier contacts have been demonstrated. The model device has a wrap-around gate, 2 nm ZrO2 dielectric, and the Fermi level of the metal contacts aligned with the conduction band of the source and drain. A number of different CNT lengths with various source/drain asymmetry are studied. A 40 nm length CNT with a 10 nm gate shows excellent performance as quantified below. We numerically calculate the gate delay (taus = C9VDD/ION), ON/OFF current ratio, and inverse subthreshold slope as a function of source to gate underlap L exS","PeriodicalId":306160,"journal":{"name":"63rd Device Research Conference Digest, 2005. DRC '05.","volume":"9 3","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimal design and coulomb blockade suppressed leakage of carbon nanotube transistors\",\"authors\":\"K. Alam, R. Lake\",\"doi\":\"10.1109/DRC.2005.1553106\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We consider a 1.5 nm diameter (19,0) CNT for which zero-Schottky-barrier contacts have been demonstrated. The model device has a wrap-around gate, 2 nm ZrO2 dielectric, and the Fermi level of the metal contacts aligned with the conduction band of the source and drain. A number of different CNT lengths with various source/drain asymmetry are studied. A 40 nm length CNT with a 10 nm gate shows excellent performance as quantified below. We numerically calculate the gate delay (taus = C9VDD/ION), ON/OFF current ratio, and inverse subthreshold slope as a function of source to gate underlap L exS\",\"PeriodicalId\":306160,\"journal\":{\"name\":\"63rd Device Research Conference Digest, 2005. DRC '05.\",\"volume\":\"9 3\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-06-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"63rd Device Research Conference Digest, 2005. DRC '05.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.2005.1553106\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"63rd Device Research Conference Digest, 2005. DRC '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2005.1553106","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

我们考虑一个直径为1.5 nm(19,0)的碳纳米管,其零肖特基势垒接触已被证明。该模型器件具有环绕栅极,2 nm ZrO2介电介质,金属触点的费米电平与源极和漏极的导带对齐。研究了具有不同源漏不对称性的碳纳米管长度。40nm长度的碳纳米管和10nm栅极显示出优异的性能,如下图所示。我们数值计算了栅极延迟(taus = C9VDD/ION)、开/关电流比和逆亚阈值斜率作为源与栅极重叠lexs的函数
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Optimal design and coulomb blockade suppressed leakage of carbon nanotube transistors
We consider a 1.5 nm diameter (19,0) CNT for which zero-Schottky-barrier contacts have been demonstrated. The model device has a wrap-around gate, 2 nm ZrO2 dielectric, and the Fermi level of the metal contacts aligned with the conduction band of the source and drain. A number of different CNT lengths with various source/drain asymmetry are studied. A 40 nm length CNT with a 10 nm gate shows excellent performance as quantified below. We numerically calculate the gate delay (taus = C9VDD/ION), ON/OFF current ratio, and inverse subthreshold slope as a function of source to gate underlap L exS
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
High-power stable field-plated AlGaN-GaN MOSHFETs A new four-terminal hybrid silicon/organic field-effect sensor device Tunnel junctions in GaN/AlN for optoelectronic applications Data retention behavior in the embedded SONOS nonvolatile memory cell Mobility and sub-threshold characteristics in high-mobility dual-channel strained Si/strainef SiGe p-MOSFETs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1