{"title":"碳纳米管晶体管的优化设计和库仑阻塞抑制泄漏","authors":"K. Alam, R. Lake","doi":"10.1109/DRC.2005.1553106","DOIUrl":null,"url":null,"abstract":"We consider a 1.5 nm diameter (19,0) CNT for which zero-Schottky-barrier contacts have been demonstrated. The model device has a wrap-around gate, 2 nm ZrO2 dielectric, and the Fermi level of the metal contacts aligned with the conduction band of the source and drain. A number of different CNT lengths with various source/drain asymmetry are studied. A 40 nm length CNT with a 10 nm gate shows excellent performance as quantified below. We numerically calculate the gate delay (taus = C9VDD/ION), ON/OFF current ratio, and inverse subthreshold slope as a function of source to gate underlap L exS","PeriodicalId":306160,"journal":{"name":"63rd Device Research Conference Digest, 2005. DRC '05.","volume":"9 3","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimal design and coulomb blockade suppressed leakage of carbon nanotube transistors\",\"authors\":\"K. Alam, R. Lake\",\"doi\":\"10.1109/DRC.2005.1553106\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We consider a 1.5 nm diameter (19,0) CNT for which zero-Schottky-barrier contacts have been demonstrated. The model device has a wrap-around gate, 2 nm ZrO2 dielectric, and the Fermi level of the metal contacts aligned with the conduction band of the source and drain. A number of different CNT lengths with various source/drain asymmetry are studied. A 40 nm length CNT with a 10 nm gate shows excellent performance as quantified below. We numerically calculate the gate delay (taus = C9VDD/ION), ON/OFF current ratio, and inverse subthreshold slope as a function of source to gate underlap L exS\",\"PeriodicalId\":306160,\"journal\":{\"name\":\"63rd Device Research Conference Digest, 2005. DRC '05.\",\"volume\":\"9 3\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-06-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"63rd Device Research Conference Digest, 2005. DRC '05.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.2005.1553106\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"63rd Device Research Conference Digest, 2005. DRC '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2005.1553106","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optimal design and coulomb blockade suppressed leakage of carbon nanotube transistors
We consider a 1.5 nm diameter (19,0) CNT for which zero-Schottky-barrier contacts have been demonstrated. The model device has a wrap-around gate, 2 nm ZrO2 dielectric, and the Fermi level of the metal contacts aligned with the conduction band of the source and drain. A number of different CNT lengths with various source/drain asymmetry are studied. A 40 nm length CNT with a 10 nm gate shows excellent performance as quantified below. We numerically calculate the gate delay (taus = C9VDD/ION), ON/OFF current ratio, and inverse subthreshold slope as a function of source to gate underlap L exS