埋栅InAlAs/InGaAs hemt的蒙特卡罗模拟

A. Endoh, I. Watanabe, A. Kasamatsu, T. Mimura
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引用次数: 0

摘要

采用蒙特卡罗(MC)方法对埋栅InAlAs/InGaAs高电子迁移率晶体管(HEMTs)进行了模拟。我们采用了t形结构作为栅极。最大跨导gm_max和栅极电容Cg随埋深d的增加而增大,且gm_max的增大幅度大于Cg。结果表明,截止频率fT随埋深d的增加而增大,这与我们之前的实验结果一致。
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Monte Carlo simulation of InAlAs/InGaAs HEMTs with buried gate
We carried out Monte Carlo (MC) simulation of InAlAs/InGaAs high electron mobility transistors (HEMTs) with buried gate. We employed a T-shaped structure as a gate electrode. The maximum transconductance gm_max and gate capacitance Cg increase with increasing the buried depth d. The extent of increase in the gm_max is more than that in Cg. As a result, the cutoff frequency fT increases with increase the buried depth d. These phenomena agree with our previous experimental results.
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