超低漏极电压=0.1V,体偏置低于1.0V的超陡亚阈斜率pn -体束缚SOI FET

Takahiro Yoshida, J. Ida, Takashi Horii, M. Okihara, Y. Arai
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引用次数: 10

摘要

结果表明,当将体系区域N区杂质浓度由高浓度N+重新设计为低浓度N-时,pn -体系SOIFET的体偏从5V以上减小到1V以下,呈现出超陡的亚阈值斜率(SS),漏极电压为0.1V。三维器件模拟也证实了这一点,并表明在杂质浓度不同的情况下,N区存在最佳长度,以产生低体偏的超陡SS。
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Super steep subthreshold slope PN-body tied SOI FET's of ultra low drain voltage=0.1V with body bias below 1.0V
It was demonstrated that the body bias appearing the super steep Subthreshold Slope (SS) reduces from over 5V to below 1V on the PN-body tied SOIFET's which show the super steep SS with the ultralow drain voltage of 0.1V, when the impurity concentration of the N region on the body tied area is redesigned from the high concentration of the N+ to the low N-. The 3D device simulations also confirmed it and indicated that the optimum length of the N region exits on the different impurity concentration of it for appearing the super steep SS with the low body bias.
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