脉冲激光沉积法低温制备Ba/ sub2 /NaNb/ sub5 /O/ sub15 /铁电薄膜

K. Ohnuki, T. Higuchi, M. Takayasu, M. Sogawa, T. Tsukamoto
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引用次数: 0

摘要

采用脉冲激光沉积法在MgO(100)衬底上制备了Ba/ sub2 /NaNb/ sub5 /O/ sub15 / (BNN)铁电薄膜。当激光功率密度和重复频率分别为200 mJ/cm/sup /和5 Hz时,衬底温度为650/spl℃,可获得C轴取向的BNN薄膜。c轴取向BNN薄膜与MgO衬底之间的界面非常光滑。c轴取向的BNN薄膜的带隙约为3.1 eV,与BNN单晶的带隙一致。
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Low-temperature preparation of ferroelectric Ba/sub 2/NaNb/sub 5/O/sub 15/ thin films by pulsed laser deposition
Ferroelectric Ba/sub 2/NaNb/sub 5/O/sub 15/ (BNN) thin films were prepared on MgO (100) substrates by pulsed laser deposition method. When the laser power density and repetition frequency were fixed at 200 mJ/cm/sup 2/ and 5 Hz, respectively, the c-axis oriented BNN thin film was obtained at substrate temperature of 650/spl deg/C. The interface between the c-axis oriented BNN thin film and MgO substrate was very smooth. The band gap of the c-axis oriented BNN thin film was about 3.1 eV, which accords to that of the BNN single crystal.
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