一个短沟道MOSFET模型

E. Valsamakis
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引用次数: 5

摘要

所描述的MOSFET等效电路模型包含了短通道和温度效应。它包括亚阈值、三极管和饱和区域的器件电流表达式,并使用依赖于场的迁移率和依赖于漏极电压的阈值电压。漏极电流-电压特性及其一阶导数在所有区域都是连续的。栅极-源和栅极-漏电容的关系是利用场相关迁移率作为器件电位的函数推导出来的。利用该模型的封闭形式表达式,对具有均匀通道和离子注入通道的微米长器件进行了模拟,并与室温、室温以上和液氮温度下的数据进行了比较。
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A short channel MOSFET model
The MOSFET equivalent circuit model described incorporates short channel and temperature effects. It includes expressions for the device current in the subthreshold, triode and saturation regions and uses a field dependent mobility and a drain voltage dependent threshold voltage. The drain current-voltage characteristic and its first derivative are continuous in all regions. Relationships for the gate-source and gate-drain capacitances are derived as a function of the device potentials using a field dependent mobility. Using the closed form expressions of this model, simulations were performed for micron long devices having uniform and ion-implanted channel profiles and compared with data at room, above room and liquid nitrogen temperature.
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