双二极管- vth降低功率门控结构,更好地减少泄漏

P. Khaled, Jingye Xu, M. Chowdhury
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引用次数: 9

摘要

泄漏已经成为影响纳米级集成电路电源管理和信号完整性的最主要因素之一。近年来,电源门控结构已被证明在控制泄漏方面是有效的。本文提出了一种替代的双二极管- vth降低功率门控结构,以更好地减少漏电流,特别是对于低功耗,高性能的便携式设备。该技术既能保持中间省电状态,又能保持常规的断电状态。实验结果表明,该技术可以显著降低HOLD和cut省电模式下的漏电流和相关功耗。还证明了所提出的技术可以显著减少由于功率模式转换引起的地面反弹。
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Dual diode-Vth reduced power gating structure for better leakage reduction
Leakage has become one of the most dominant factors of power management and signal integrity of nanometer scale integrated circuits. Recently, power gating structures has proven to be effective in controlling leakage. In this paper an alternative dual diode-Vth reduced power gating structure is proposed for better reduction of leakage currents, especially for low-power, high-performance portable devices. The proposed technique maintains an intermediate power saving state as well as the conventional power cut-off state. Experimental results have demonstrated that the proposed technique can significantly reduce leakage current and associated power consumptions during the HOLD and CUT-OFF power saving modes. It has also been demonstrated that the proposed technique significantly reduces ground bounce due to power mode transition.
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