高击穿电压应用于功率IC半导体的成型化合物

A. S. Chen, A. Shafi, R. W. Busse, R. Orr, R. Lo
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引用次数: 15

摘要

功率集成电路(IC)半导体器件对任何类型的工艺变化、器件和封装材料的影响以及环境变化和应力都很敏感,这些都会影响它们在工作期间承受最大施加电压的能力。例如,环氧成型化合物与模具表面之间的接触可以从根本上改变电性能,特别是在环境应力之后。其中一些可能是机械的,由热不匹配引起的。其他原因可能是成型化合物和器件钝化内电荷之间的化学相互作用,这也会受到类型的很大影响。不幸的是,缺乏关于电子封装对高压器件行为的影响的文献。在这项研究中,研究了成型化合物对高压金属氧化物半导体场效应晶体管(MOSFET)击穿电压稳定性的影响,利用了表面电场还原(RESURF)技术。采用高温反向偏置(HTRB)测试了击穿稳定性。化合物和模后固化过程都被发现影响击穿电压,然而,也很清楚,化合物不是单独起作用的,有必要评估芯片钝化,以及它与成型化合物的相互作用。
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Molding compounds for high breakdown voltage applications on power IC semiconductors
Power integrated circuits (IC) semiconductor devices are sensitive to any sort of process variations, device and package materials effects, and environmental changes and stresses that will affect their ability to withstand the maximum applied voltage during operation. For example, contact between the epoxy molding compound and the die surface can radically alter the electrical performance, especially after environmental stressing. Some of this could be mechanical, caused by thermal mismatch. Other reasons could be chemical interactions between the molding compound and the charges within the device passivation, which would also be greatly influenced by type. Unfortunately, there is a lack of literature available on electronic package effects on high voltage device behavior. In this study, the effect of molding compound on the breakdown voltage stability of a high voltage metal oxide semiconductor-field effect transistor (MOSFET), utilizing the RESURF (Reduced SURFace electric field) technique, was examined. Breakdown stability was tested by High Temperature Reverse Bias (HTRB) testing. Both compound and post-mold cure processes were found to affect the breakdown voltage, however, it also became clear that the compounds were not acting alone and it would be necessary to evaluate the chip passivation as well, and its interaction with the molding compound.
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