采用Ta2O5绝缘体和不同电极材料的ReRAM多层存储性能评价

Yuanlin Li, Reon Katsumura, Mika Grönroos, A. Tsurumaki‐Fukuchi, M. Arita, H. Andoh, T. Morie, Yasuo Takahashi
{"title":"采用Ta2O5绝缘体和不同电极材料的ReRAM多层存储性能评价","authors":"Yuanlin Li, Reon Katsumura, Mika Grönroos, A. Tsurumaki‐Fukuchi, M. Arita, H. Andoh, T. Morie, Yasuo Takahashi","doi":"10.23919/SNW.2017.8242309","DOIUrl":null,"url":null,"abstract":"ReRAM (Resistive Random Access Memory) has been drawing attention for its neural network applications with low-power and high-speed operation. The multilevel data storage capability is inherently needed to use the ReRAM as synaptic devices. In this study, two ReRAM devices with different electrode materials in which the operation mechanisms are thought to be different was fabricated and tested. It was clarified that the multilevel resistance characteristics were achieved in both devices.","PeriodicalId":424135,"journal":{"name":"2017 Silicon Nanoelectronics Workshop (SNW)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Evaluation of multilevel memory capability of ReRAM using Ta2O5 insulator and different electrode materials\",\"authors\":\"Yuanlin Li, Reon Katsumura, Mika Grönroos, A. Tsurumaki‐Fukuchi, M. Arita, H. Andoh, T. Morie, Yasuo Takahashi\",\"doi\":\"10.23919/SNW.2017.8242309\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"ReRAM (Resistive Random Access Memory) has been drawing attention for its neural network applications with low-power and high-speed operation. The multilevel data storage capability is inherently needed to use the ReRAM as synaptic devices. In this study, two ReRAM devices with different electrode materials in which the operation mechanisms are thought to be different was fabricated and tested. It was clarified that the multilevel resistance characteristics were achieved in both devices.\",\"PeriodicalId\":424135,\"journal\":{\"name\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/SNW.2017.8242309\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Silicon Nanoelectronics Workshop (SNW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SNW.2017.8242309","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

电阻式随机存取存储器(ReRAM)以其低功耗、高速运行的神经网络应用而备受关注。使用ReRAM作为突触设备,需要具有多层数据存储能力。在本研究中,制备了两种不同电极材料的ReRAM器件,并对其操作机制进行了测试。结果表明,两种器件均实现了多电平电阻特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Evaluation of multilevel memory capability of ReRAM using Ta2O5 insulator and different electrode materials
ReRAM (Resistive Random Access Memory) has been drawing attention for its neural network applications with low-power and high-speed operation. The multilevel data storage capability is inherently needed to use the ReRAM as synaptic devices. In this study, two ReRAM devices with different electrode materials in which the operation mechanisms are thought to be different was fabricated and tested. It was clarified that the multilevel resistance characteristics were achieved in both devices.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Revisiting room-temperature 1.54 μιη photoluminescence of ErOx centers in silicon at extremely low concentration Undoped SiGe FETs with metal-insulator-semiconductor contacts Improved electrical characteristics and reliability of multi-stacking PNPN junctionless transistors using channel depletion effect Program/erase speed and data retention trade-off in negative capacitance versatile memory Investigations on dynamic characteristics of ferroelectric Hf02 based on multi-domain interaction model
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1