{"title":"分层CAD数据/电子束曝光数据转换中重叠单元处理的新算法","authors":"T. Okubo, Takashi Watanabe, K. Wada","doi":"10.1109/DAC.1990.114874","DOIUrl":null,"url":null,"abstract":"An electron beam exposure system used for LSI mask making or direct writing for ASICs is considered. In CAD data/electron beam exposure-data conversion, a new algorithm for treating overlapping cells hierarchically is proposed. Geometric transformations, such as resizing, for overlapping cells are performed without referring to other cells by introducing a data marking structure. The conversion time of a 16M DRAM and 70 K-gate LSI circuits becomes as short as 23 and 62 CPU minutes, respectively, using a 12-MIPS computer.<<ETX>>","PeriodicalId":118552,"journal":{"name":"27th ACM/IEEE Design Automation Conference","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"New algorithm for overlapping cell treatment in hierarchical CAD data/electron beam exposure data conversion\",\"authors\":\"T. Okubo, Takashi Watanabe, K. Wada\",\"doi\":\"10.1109/DAC.1990.114874\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An electron beam exposure system used for LSI mask making or direct writing for ASICs is considered. In CAD data/electron beam exposure-data conversion, a new algorithm for treating overlapping cells hierarchically is proposed. Geometric transformations, such as resizing, for overlapping cells are performed without referring to other cells by introducing a data marking structure. The conversion time of a 16M DRAM and 70 K-gate LSI circuits becomes as short as 23 and 62 CPU minutes, respectively, using a 12-MIPS computer.<<ETX>>\",\"PeriodicalId\":118552,\"journal\":{\"name\":\"27th ACM/IEEE Design Automation Conference\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"27th ACM/IEEE Design Automation Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DAC.1990.114874\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"27th ACM/IEEE Design Automation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DAC.1990.114874","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
New algorithm for overlapping cell treatment in hierarchical CAD data/electron beam exposure data conversion
An electron beam exposure system used for LSI mask making or direct writing for ASICs is considered. In CAD data/electron beam exposure-data conversion, a new algorithm for treating overlapping cells hierarchically is proposed. Geometric transformations, such as resizing, for overlapping cells are performed without referring to other cells by introducing a data marking structure. The conversion time of a 16M DRAM and 70 K-gate LSI circuits becomes as short as 23 and 62 CPU minutes, respectively, using a 12-MIPS computer.<>
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