用Pd催化剂生长无缺陷InAs纳米线

H. Y. Xu, Y. Guo, Z. Liao, J. Zou, Q. Gao, H. Tan, C. Jagadish
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引用次数: 0

摘要

为了探索非金催化剂在III-V外延纳米线生长中的作用机理和影响,以退火Pd薄膜为催化剂,在GaAs(111)B衬底上生长InAs纳米线。通过详细的扫描电镜和透射电镜(SEM/TEM)表征发现,当催化剂尺寸小于50 nm时(从Pd薄膜退火),无缺陷的锌-闪锌矿结构的外延InAs纳米线沿着具有四个{111}侧面的方向生长。常见的纳米线/催化剂界面是纳米线的不寻常的{113}面。
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Growth of defect-free InAs nanowires using Pd catalyst
To explore the growth mechanism and the effect of non-gold catalysts in growing III-V epitaxial nanowires, InAs nanowires were grown on GaAs(111)B substrates using annealed Pd thin film as catalyst. Through detailed scanning and transmission electron microscopy (SEM/TEM) characterisations, it is found that when the catalyst size is less than 50 nm (from annealing the Pd thin film), defect-free zinc-blende structured epitaxial InAs nanowires are grown along the <;110> directions with four {111} side-facets. The common nanowire/catalyst interface is found to be the unusual {113} planes of the nanowires.
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