启用大小以增强静态噪声边界

Valeriu Beiu, A. Beg, W. Ibrahim, F. Kharbash, M. Alioto
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引用次数: 16

摘要

本文提出了一种在先进技术节点和低电压下实现的经典CMOS栅极晶体管尺寸的方法。该方法通过均匀增大所有晶体管的长度(L)和平衡电压传递曲线(VTCs)来最大化静态噪声裕度(SNMs)。我们使用最著名的CMOS门(INV, NAND-2, NOR-2)来介绍新的尺寸方法,以及验证概念和评估其性能。结果表明,尺寸并没有完全耗尽其潜力,允许超越已经建立的延迟功率权衡,因为尺寸可以通过以下方式增加SNMs:(i)调整阈值电压(VTH)及其变化(σVTH);及(ii)平衡职业训练局。仿真结果表明,这种尺寸方法可以实现更可靠(即噪声鲁棒性和容差性)的CMOS门,可以在非常低的电源电压下正确工作,从而实现超低电压/功率电路。
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Enabling sizing for enhancing the static noise margins
This paper suggests a transistor sizing method for classical CMOS gates implemented in advanced technology nodes and operating at low voltages. The method relies on upsizing the length (L) of all transistors uniformly, and balancing the voltage transfer curves (VTCs) for maximizing the static noise margins (SNMs). We use the most well-known CMOS gates (INV, NAND-2, NOR-2) for introducing the novel sizing method, as well as for validating the concept and evaluating its performances. The results show that sizing has not entirely exhausted its potential, allowing to go beyond the well established delay-power tradeoff, as sizing can increase SNMs by: (i) adjusting the threshold voltages (VTH) and their variations (σVTH); and (ii) balancing the VTCs. Simulation results show that this sizing method enables more reliable (i.e., noise-robust and variation-tolerant) CMOS gates, which could operate correctly at very low supply voltages, hence leading to ultra-low voltage/power circuits.
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