Pembangkitan等离子体Menggunakan Metode高压直流Untuk应用直流磁控溅射

Syarifah Nihlah Yahya, Fadli Robiandi, Ikal Maknun
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摘要

直流磁控溅射是一种以等离子体为介质的物理气相沉积(PVD)技术。在本实验中,真空泵、真空管(等离子体电抗器)、电容器、MOT变压器、高压桥式二极管、稳压变压器是直流磁控溅射的主要仪器。通过电离真空管中被困住的气体,我们创造了等离子体。电离过程可以通过给等离子体反应器中形成等离子体的被困气体施加直流高压来完成。直流高压电力(800-1600伏)可以使用稳压变压器、MOT变压器、高压桥式二极管和高压电容器形成。等离子体在两个不同的真空泵和2、4、6、8厘米的电极之间被点燃。从实验中,我们在稳压变压器上得到35伏的等离子体,在电极上测量得到464伏的等离子体。
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Pembangkitan Plasma Menggunakan Metode High-Voltage Direct Current Untuk Aplikasi Direct Current Magnetron Sputtering
Direct Current (DC) magnetron sputtering is one of the Physical Vapour Deposition (PVD) technique that use plasma as a medium. In this experiment, vacuum pumps, vacuum tubes (plasma reactor), capacitor, MOT transformers, HV bridge diodes, and regulator transformers is the main instrumen of DC magnetron sputtering. By ionizing the trapped gas inside the vacuum tube we created the plasma. The ionization process can be done by giving DC high voltage electricity to the trapped gas in the plasma reactor that formed plasma. DC high voltage electricity (at 800-1600 Volt) can be form using regulator transformers, MOT transformers, HV bridge diodes, and HV capacitor. Plasma’s are ignited with the distance between the electrodes which is 2, 4, 6, and 8 cm and two different vacuum pump. From the experiment we got plasma at 35 Volt on regulator transformers or 464 Volt that measure on the electrodes.
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