采用滚印硅纳米带的高性能n沟道和p沟道柔性晶体管

Ayoub Zumeit, A. Dahiya, Adamos Christou, R. Dahiya
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引用次数: 0

摘要

高迁移率纳米/微尺度结构的均匀和大面积印刷可以实现高性能柔性电子器件,这在许多电子和光电子应用中是非常需要的。在这项工作中,我们报告了一种优化的直接滚转印刷方法,可以将高迁移率硅纳米带(Si NRs)阵列集成在各种柔性衬底上,包括聚酰亚胺,聚对苯二甲酸乙二醇酯和金属箔等。与传统的转移印花相比,所开发的方法不需要使用弹性转移印花。因此,在~2 cm2的印刷面积上,在打印结构的精度(~100nm)和优异的转移率(~95%)方面取得了显著的改进。这些特性对于在大范围内实现统一的设备间性能特性是必不可少的。进一步,研究了作用力对传递屈服的依赖关系。通过实现基于n沟道和p沟道硅nr - fet的高性能柔性场效应晶体管(Si nr - fet),证明了所开发的基于辊式转移印刷工艺的有效性。本工作为印刷高性能集成电路开辟了新的途径。
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High performance n-and p-channel flexible transistors using roll printed silicon nanoribbons
Uniform and large-area printing of high mobility nano/microscale structures can enable high-performance flexible electronics, which is much needed in numerous electronic and optoelectronic applications. In this work, we report an optimized direct roll transfer printing method to integrate arrays of high mobility silicon nanoribbon (Si NRs) in a single step on a variety of flexible substrates including polyimide, polyethylene terephthalate, and metal foils, etc. Compared to conventional transfer printing, the developed method does not require the use of elastomeric transfer stamp. In consequence, significant improvements are accomplished in terms of accuracy of printed structures (~100nm) and excellent transfer yield (~95%) over printed area of ~2 cm2. Such features are essential to achieve uniform device-to-device performance characteristics over large areas. Further, the dependency study of the applied force on transfer yield is performed. The efficacy of the developed roll-based transfer printing process is demonstrated by realizing both n-and p-channel silicon NRs based high performance flexible field-effect transistors (Si NR-FETs). The present work opens new avenues for printed high performance integrated circuits.
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