Laminated wafer with the conductive diamond layer using surface activated bonding at room temperature for micro-electro mechanical systems sensors

We proposed the fabrication of the laminated wafer with the conductive diamond layer as an alternative SOI wafer for micro-electro mechanical systems (MEMS) sensors by chemical vapor deposition (CVD) and surface-activated bonding (SAB), in order to prevent the charge-up of devices on a BOX layer during plasma treatments. We demonstrated that the use of this laminated wafer could be deposited the boron-doped diamond layer and be bonded a silicon wafer (layer) at room temperature without a thermal stress. Therefore, we believe that this laminated wafer can contribute to the improvement of MEMS sensors as an alternative SOI wafer.