声子散射在硅量子点中的电子弛豫

M. Dur, A. Gunther, D. Vasileska, S. Goodnick
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引用次数: 0

摘要

从理论上研究了基于n型反转层的p型Si[100]表面全量子化系统中电子的声子散射。法向Si/SiO/ sub2 /界面的限制势由三角形量子阱模拟。对于侧向约束,我们假定为抛物线势。计算结果表明,各向异性电子-声子相互作用对散射速率有较大影响。计算得到的电子从第一激发态到基态的跃迁速率与空间约束和晶格温度密切相关。
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Electron relaxation in silicon quantum dots by acoustic phonon scattering
Acoustic phonon scattering of electrons in fully quantized systems based on n-type inversion layers on a [100] surface of p-type Si is studied theoretically. The confining potential normal to the Si/SiO/sub 2/ interface is modeled by a triangular quantum well. For the confinement in the lateral directions we assume a parabolic potential. The calculations reveal that the anisotropic electron-phonon interaction strongly affects the scattering rate. The calculated transition rate of electrons from the first excited to the ground state shows a strong dependence on spatial confinement and lattice temperature.
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