具有绝缘Langmuir-Blodgett薄膜的MIS二极管的电学特性

F. Kaneko, M. Shibata, S. Kobayashi
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引用次数: 1

摘要

研究了具有Langmuir-Blodgett聚二乙炔薄膜的金属-绝缘体-半导体二极管的电学性能。测量的Al-LB PDA-Si (MIS)二极管的电容电压特性显示出合理的累积电容。在偏置电压的作用下,C-V曲线呈现迟滞现象,且存在平带电压偏移。这些结果显示了Si在MIS二极管中的电荷注入。测量了Al-LB - PDA-Al金属-绝缘体-金属结构的热激电流(tsc)。在低温区和高温区分别观察到由偶极子极化和电荷注入引起的TSC峰
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Electrical properties of MIS diodes with insulating Langmuir-Blodgett thin films
Electrical properties are investigated for metal-insulator-semiconductor diodes having Langmuir-Blodgett polydiacetylene (LB PDA) thin films. Capacitance-voltage characteristics measured for the Al-LB PDA-Si (MIS) diodes show reasonable capacitances for the accumulation. The C-V curves show hysteresis, and flatband voltage shifts are observed under the application of bias voltages. These results show charge injection from Si in the MIS diodes. Thermally stimulated currents (TSCs) are measured for Al-LB PDA-Al metal-insulator-metal structures. TSC peaks caused by dipole polarization and charge injection are observed in the low- and high-temperature regions respectively.<>
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