用于ph传感的RF溅射沉积氧化铟锌薄膜

J. Chiang, Yi-Yan Lin
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引用次数: 0

摘要

在本研究中,采用射频溅射技术在硅衬底上沉积了氧化铟锌(IZO)薄膜。IZO/Si传感结构作为一次性传感器头,连接到MOSFET的栅极端。将IZO扩展栅场效应晶体管(EGFET)传感结构和Ag/AgCl参比电极浸入不同的缓冲溶液(pH=1、3、5、7、9、11)中。然后,测量并分析了电流-电压(I-V)特性曲线和pH敏感性。实验结果表明,IZO EGFET的pH灵敏度约为52 mV/pH, pH感应响应为线性(~1)。IZO pH-EGFET具有优良的传感特性,可用于$H^{+}-$离子浓度的检测。
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Deposited Indium-Zinc-Oxide Thin Film by RF Sputtering for pH-Sensing Application
In this study, the indium-zinc-oxide(IZO) thin mms were deposited on silicon substrates by r.f. sputtering. The IZO/Si sensing structure was used as a disposable sensor head and connected to the gate terminal of MOSFET. The IZO extended-gate field-effect transistor (EGFET) sensing structure and the Ag/AgCl reference electrode were immersed into the different buffer solutions (pH=1,3,5,7,9,11). Afterward, the current-voltage (I-V) characteristics curves and the pH sensitivity were measured and analyzed. According to the experimental results, the pH sensitivity of the IZO EGFET was obtained at approximately 52 mV/pH, and the pH-sensing response is linear (~1). The superior sensing properties of IZO pH-EGFET can be applied to detecting the $H^{+}-$ion concentrations.
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