在Ar或Ar - nh3 DBDs中注入金属盐合成含金nps薄膜

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2023-11-11 DOI:10.1007/s11090-023-10400-4
Alexandre Perdrau, Noémi Barros, Rocío Rincón, Hervé Glénat, Stéphanie Truong, Sarra Gam Derouich, Xiaonan Sun, Philippe Decorse, Sophie Nowak, Béatrice Plujat, Souad Ammar, Jean-Pascal Borra, Fiorenza Fanelli, Françoise Massines
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引用次数: 1

摘要

研究了常压等离子体增强化学气相沉积法制备金属/聚合物纳米复合薄膜。将异丙醇溶解的四氯金酸(HAuCl4:3H2O金盐)气溶胶注入介质阻挡放电中,合成等离子体纳米复合薄膜。以氩气为载气,添加或不添加133 ppm的氨(NH3),分别得到或不得到潘宁混合物。结果表明,NH3对盐还原和薄膜性能影响较大。根据气溶胶表征,等离子体入口的尺寸分布支持异丙醇主要在注入前在等离子体中蒸发。盐最初溶解在每个液滴中,在蒸发过程中沉淀,在注射前形成直径约30纳米的固体纳米颗粒,最终有溶剂痕迹。然后,对纳米复合薄膜进行了研究。光学性质,如等离子体共振,是由紫外-可见吸收光谱表征。使用x射线光电子能谱和拉曼能谱分析化学成分,辅以x射线衍射分析以及扫描透射电子显微镜模式下的能量色散能谱(SEM)获得的化学作图。此外,通过原子力显微镜和扫描电镜研究了沉积物的形态,突出了NH3气体对薄膜性质的影响,从而在整个沉积过程中发挥了作用。最后,等离子体的光学发射光谱为更好地理解NH3的作用提供了线索。总体结果表明,盐纳米粒子在等离子体相被还原,导致非聚集的金属金纳米粒子嵌入由异丙醇聚合形成的碳基基体中。等离子体中NH3的存在明显地降低了盐还原并影响了薄膜的性能,从而改变了与嵌入NPs的大小、浓度和组成相关的等离子体响应。
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Synthesis of Gold NPs-Containing Thin Films from Metal Salt Injection in Ar or Ar–NH3 DBDs

This study focuses on metal/polymer nanocomposite thin films made by atmospheric pressure Plasma-Enhanced Chemical Vapor Deposition. The aerosol of isopropanol-dissolved tetrachloroauric acid (HAuCl4:3H2O gold salt) is injected in a dielectric barrier discharge to synthesize plasmonic nanocomposite thin films. Argon is used as carrier gas with or without 133 ppm addition of ammonia (NH3) to respectively get or not a Penning mixture. Results show that NH3 largely influences the salt reduction and thin film properties. According to the aerosol characterization, the size distribution at the plasma entrance supports that isopropanol mainly evaporates before injection in the plasma. The salt initially dissolved in each droplet precipitates during evaporation before injection as solid nanoparticles of about 30 nm diameter with eventual traces of solvent. Then, the nanocomposite thins film are studied. Optical properties, as plasmonic resonance, are characterized by UV–visible absorption spectroscopy. The chemical composition is analyzed using X-ray photoelectron spectroscopy and Raman spectroscopy, complemented by X-ray diffraction analysis as well as chemical mapping obtained by Energy dispersive spectroscopy coupled to scanning electron microscopy (SEM) operating in Scanning Transmission Electron Microscopy mode. Additionally, the morphology of the deposits is investigated by atomic force microscopy and SEM, highlighting the influence of NH3 gas on the film nature and therefore its role in the overall deposition process. Finally, optical emission spectroscopy of the plasma gives clue to better understand the effect of NH3. The overall results show that the salt nanoparticles are reduced in the plasma phase leading to non-aggregated metal Au NPs embedded in a carbon-based matrix formed by isopropanol polymerization. The presence of NH3 in the plasma unambiguously decreases the salt reduction and affects the thin film properties, consequently changing their plasmonic response related to the size, concentration, and composition of the embedded NPs.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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