Optimized APCVD Method for Synthesis of Monolayer H-Phase VS2 Crystals

Abstract Monolayer transition metal dichalcogenides, specifically H-phase vanadium disulfide (VS2), hold great significance as fundamental components for next-generation low-dimensional spintronic, optoelectronic, and future electronic devices. They also offer an opportunity to explore the intrinsic magnetic properties associated with monolayer H-phase VS2 crystals at room temperature. However, there have been limited experimental studies on synthesizing pure monolayer H-phase VS2 crystals using sodium metavanadate (NaVO3) and sulfur (S) as precursors for vanadium (V) and S, respectively. In this study, we present a facile atmospheric pressure chemical vapor deposition (APCVD) approach for the synthesizing monolayer H-phase VS2 crystals with a thickness of ∼0.7 nm. The lateral dimensions of monolayer VS2 crystals extends up to ∼26 µm. Additionally, we have modulated the growth parameters, such as the temperature of NaVO3 and the Ar gas flow rate, to obtain VS2 flakes with different sizes and morphologies. This significant advancement paves the way for the synthesis of monolayer H-phase VS2 crystals on SiO2/Si substrates using the APCVD technique.