使用片上低温互补金属氧化物半导体有源电感器的多路量子器件阻抗测量法

Chip Pub Date : 2023-12-01 DOI:10.1016/j.chip.2023.100068
L. Le Guevel , G. Billiot , S. De Franceschi , A. Morel , X. Jehl , A.G.M. Jansen , G. Pillonnet
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引用次数: 0

摘要

在追求可扩展量子处理器的过程中,人们致力于开发低温经典硬件,以控制和读出越来越多的量子比特。目前的工作提出了一种称为阻抗测量的新方法,适合测量连接到谐振 LC 电路的半导体量子比特的量子电容。阻抗测量电路在谐振器中集成了互补金属氧化物半导体(CMOS)有源电感器,谐振频率和品质因数可调,从而优化了量子器件的读出灵敏度。实现的低温电路可进行快速阻抗检测,测量电容分辨率低至 10 aF,输入参考噪声为 3.7 aF/Hz。在 4.2 K 时,有源电感器的功耗为 120 μW,另外还有用于片上电流激励(0.15 μW)和阻抗测量电压放大(2.9 mW)的耗散。与需要毫米级无源电感器的基于色散射频反射测量法的常用方案相比,该电路的占地面积显著减少(50 μm × 60 μm),便于集成到可扩展的量子级架构中。阻抗测量法已在 4.2 K 温度下应用于检测片上纳米 CMOS 晶体管栅极电容中的量子效应,这些晶体管通过多路复用进行单独寻址。
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Impedancemetry of multiplexed quantum devices using an on-chip cryogenic complementary metal-oxide-semiconductor active inductor

In the pursuit for scalable quantum processors, significant effort has been devoted to the development of cryogenic classical hardware for the control and readout of a growing number of qubits. The current work presented a novel approach called impedancemetry that is suitable for measuring the quantum capacitance of semiconductor qubits connected to a resonant LC-circuit. The impedancemetry circuit exploits the integration of a complementary metal-oxide-semiconductor (CMOS) active inductor in the resonator with tunable resonance frequency and quality factor, enabling the optimization of readout sensitivity for quantum devices. The realized cryogenic circuit allows fast impedance detection with a measured capacitance resolution down to 10 aF and an input-referred noise of 3.7 aF/Hz. At 4.2 K, the power consumption of the active inductor amounts to 120 μW, with an additional dissipation for on-chip current excitation (0.15 μW) and voltage amplification (2.9 mW) of the impedance measurement. Compared to the commonly used schemes based on dispersive RF reflectometry which require millimeter-scale passive inductors, the circuit exhibits a notably reduced footprint (50 μm × 60 μm), facilitating its integration in a scalable quantum-classical architecture. The impedancemetry method has been applied at 4.2 K to the detection of quantum effects in the gate capacitance of on-chip nanometric CMOS transistors that are individually addressed via multiplexing.

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