探讨体积介质阻挡放电对植物病原真菌抑制作用的影响因素

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2023-10-14 DOI:10.1007/s11090-023-10394-z
Palma Rosa Rotondo, Domenico Aceto, Caterina Rotolo, Marianna Ambrico, Giorgio Dilecce, Francesco Faretra, Rita Milvia De Miccolis Angelini, Paolo Francesco Ambrico
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引用次数: 1

摘要

近年来,低温等离子体作为一种有效的微生物灭活工具显示出巨大的应用潜力。然而,需要进一步调查以充分了解影响这些过程的可能因素。本研究旨在研究方波调制体积介质阻挡放电在5种不同真菌种类、不同放电条件和介质组成下对孢子萌发的直接抑制效果。所使用的五种不同的真菌分别是灰葡萄孢菌、果实念珠菌、碳曲霉、谷物镰刀菌和互交霉。在水琼脂上,施加电压对灰霉病菌的抑制作用有影响,这主要反映了处理的均匀性。在选择的电压条件下,抑制作用随处理时间的延长而增加,随真菌孢子复杂性的增加而降低。单细胞分生孢子和黑素含量低的果霉和灰霉表现出相似的行为和高的敏感性。f . graminearum和a . alternata多细胞分生孢子,更耐等离子体处理和显示不同的敏感性可能由于黑色素的不同内容。然而,处理1 min后,所有被试物种的分生孢子萌发均被完全抑制。含葡萄糖或麦芽提取物的不同琼脂培养基对炭黑弧菌的抑制作用受培养基的复杂性和组成的影响,以马铃薯葡萄糖琼脂更能抑制其血浆效果。通过电阻抗谱和扫描电子显微镜图像观察到的形态,每种介质表现出不同的电响应。这些差异转化为对外加电场的不同响应,影响等离子体的产生和均匀性。
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Exploring Factors Influencing the Inhibitory Effect of Volume Dielectric Barrier Discharge on Phytopathogenic Fungi

The application of Low-Temperature Plasmas has shown great potential as an effective and alternative tool for microbial inactivation in recent years. Nevertheless, further investigations are required to fully understand the possible factors influencing these processes. The present study aims to investigate the effectiveness of square wave modulated Volume Dielectric Barrier Discharge on the direct inhibition of conidial germination in five different fungal species, various discharge conditions, and medium composition. The five different fungal species used were Botrytis cinerea, Monilinia fructicola, Aspergillus carbonarius, Fusarium graminearum, and Alternaria alternata. On water agar, the inhibition of Botrytis cinerea was influenced by the applied voltage, which mainly reflects the uniformity of the treatment. Under the selected voltage condition, the inhibition increased with treatment duration and decreased with fungal spore complexity. B. cinerea and M. fructicola, with unicellular conidia and low melanin content, showed similar behaviour and high sensitivity to the treatment. F. graminearum and A. alternata, both having multicellular conidia, were more resistant to the plasma treatment and showed different sensitivity likely due to different content in melanin. However, after 1 min of treatment, complete inhibition of conidial germination was achieved for all the tested species. Inhibition of A. carbonarius conidia on different agarized media containing dextrose or malt extract was influenced by the complexity and composition of the medium, being potato dextrose agar that more hindered the plasma efficacy. Each medium exhibited a different electrical response studied by Electrical Impedance Spectroscopy and morphology observed by Scanning Electron Microscopy images. These differences translated into a different response to the applied electrical field, influencing plasma generation and uniformity.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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