硅纳米颗粒:制备、表征、应用与展望

IF 4.7 Q2 NANOSCIENCE & NANOTECHNOLOGY Micro and Nano Systems Letters Pub Date : 2023-11-23 DOI:10.1186/s40486-023-00184-9
Taeyeong Kim, Jungchul Lee
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引用次数: 0

摘要

硅纳米粒子由于其高能量容量和优异的光学性能等固有特性,已成为纳米科学和纳米工程领域的重要组成部分。到目前为止,已经研究了许多制造和表征技术,同时开发了一系列利用它们的应用。在这篇综述中,我们的目的是简要概述不同的和有代表性的硅纳米颗粒的制造方法,包括自顶向下,自底向上和还原方法。然后,我们研究了评估和确保制备的硅纳米颗粒的质量和性能所必需的各种表征技术。此外,我们还为硅纳米颗粒技术的进一步发展提供了见解。
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Silicon nanoparticles: fabrication, characterization, application and perspectives

Silicon nanoparticles have emerged as pivotal components in nanoscience and nanoengineering due to their inherent characteristics such as high energy capacity and outstanding optical properties. Numerous fabrication and characterization techniques have been researched so far, while a range of applications utilizing them have been developed. In this review, we aim to provide a brief overview of the distinct and representative fabrication methods of silicon nanoparticles, including top-down, bottom-up, and reduction approaches. Then, we look into various characterization techniques essential for assessing and ensuring quality and performance of fabricated silicon nanoparticles. In addition, we provide insights for silicon nanoparticle technology towards further advancements.

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来源期刊
Micro and Nano Systems Letters
Micro and Nano Systems Letters Engineering-Biomedical Engineering
CiteScore
10.60
自引率
5.60%
发文量
16
审稿时长
13 weeks
期刊最新文献
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