在 200 kV 透射电子显微镜中实现 1.5 T 平面磁场的原位磁化支架

IF 2.1 3区 工程技术 Q2 MICROSCOPY Ultramicroscopy Pub Date : 2024-03-06 DOI:10.1016/j.ultramic.2024.113950
Tian Bai , Xin Sun , Jiazhuan Qin , Fei Li , Qiang Gao , Weixing Xia , Renjie Chen , Aru Yan , Wei Li
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引用次数: 0

摘要

洛伦兹透射电子显微镜(LTEM)需要强大的面内磁场来观察高矫顽力材料磁畴结构的演变,特别是在稀土永磁研究中。然而,目前在 200 千伏或 300 千伏 TEM 中应用的原位磁化支架的最大磁场不超过 0.1 T。本研究分析了磁场过低的原因,并通过减小磁场发生器的磁场应用面积显著提高了磁场强度。通过有限元法计算和实验测量,我们的新支架在 200 千伏的 TEM 中实现了 1.5 T 的面内磁场,而且仍能获得质量良好的图像。使用新开发的支架,观察了热压钕铁硼磁体的磁化过程。这种原位磁化支架可用于多种磁性材料的研究。
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An in-situ magnetising holder achieving 1.5 T in-plane field in 200 kV transmission electron microscope

A strong in-plane magnetic field is required for Lorentz transmission electron microscopy (LTEM) to observe the evolution of the magnetic domain structure of materials with high coercivity, particularly for research on rare-earth permanent magnets. However, the maximum field of the present in-situ magnetising holder applied in 200-kV or 300-kV TEM does not exceed 0.1 T. In this study, the reason for the low field was analysed, and the field strength was significantly elevated by reducing the field application area of the field generator. From finite element method calculations and experimental measurements, a 1.5 T in-plane field was achieved by our new holder in a 200-kV TEM, and images with good quality could still be obtained. Using the newly developed holder, the magnetisation process of hot-pressed NdFeB magnets was observed. The in-situ magnetising holder can be used in research on a wide variety of magnetic materials.

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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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