使用高速摄像机和密集电荷耦合器件摄像机对 150 kHz 高功率脉冲猝发高频放电进行时间分辨观测

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, APPLIED Japanese Journal of Applied Physics Pub Date : 2024-05-14 DOI:10.35848/1347-4065/ad3d67
Naohiro Takahashi, Hikaru Suenaga, Genta Ichii, Katsuyuki Takahashi, Seiji Mukaigawa and Koichi Takaki
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引用次数: 0

摘要

观察了 150 kHz 高功率脉冲猝发放电的放电相位和时间演变。通过连接玻璃管构建了一个真空室,在玻璃管上缠绕了一个电磁线圈。向电磁线圈施加宽度为 1000 μs、重复频率为 10 Hz 的脉冲串。使用高速摄像机和集束 CCD 摄像机记录放电照片。高速摄像机对放电阶段的观察表明,放电发生在 40 μs 时,并从圆柱形反应器的壁上传播。随着时间的推移,放电模式不断演变,出现了分支模式。分支的数量随时间变化。放电闪烁与瞬时功率同步,这表明放电是由线圈两侧产生的静电场产生并维持的。从下游计算出的传播速度随压力的增加而减小,随功率的增加而增大。
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Time-resolved observation of 150 kHz high-power pulse burst high-frequency discharge using a high-speed video camera and an intensified charge coupled device camera
The discharge phase and time evolution of a 150 kHz high-power pulse burst discharge were observed. A vacuum chamber was constructed by connecting glass tubes on which a solenoid coil was wound. Burst pulses with a width of 1000 μs and a repetition rate of 10 Hz were applied to the solenoid coil. A high-speed video camera and an intensified CCD camera were used to record photographs of the discharges. Observation of the discharge phase using a high-speed camera showed that the discharge occurs at the time of 40 μs and propagates from the wall of the cylindrical reactor. Over time, the discharge pattern evolves, and a branched pattern appears. The number of the branches changes with time. The discharge blinks synchronize with the instantaneous power, which suggests that the discharge is generated and maintained by the electrostatic field generated by the sides of the coil. The propagation velocity calculated from downstream decreases with increasing pressure and increases with increasing power.
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来源期刊
Japanese Journal of Applied Physics
Japanese Journal of Applied Physics 物理-物理:应用
CiteScore
3.00
自引率
26.70%
发文量
818
审稿时长
3.5 months
期刊介绍: The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP). JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields: • Semiconductors, dielectrics, and organic materials • Photonics, quantum electronics, optics, and spectroscopy • Spintronics, superconductivity, and strongly correlated materials • Device physics including quantum information processing • Physics-based circuits and systems • Nanoscale science and technology • Crystal growth, surfaces, interfaces, thin films, and bulk materials • Plasmas, applied atomic and molecular physics, and applied nuclear physics • Device processing, fabrication and measurement technologies, and instrumentation • Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS
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