利用扫描透射电子显微镜对异质结构进行摩尔条纹成像。

IF 2.5 3区 工程技术 Q1 MICROSCOPY Micron Pub Date : 2024-06-22 DOI:10.1016/j.micron.2024.103679
Wen-Tao Hu , Min Tian , Yu-Jia Wang , Yin-Lian Zhu
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引用次数: 0

摘要

众所周知,在传统的透射电子显微镜(TEM)中,异质结构双层晶体试样会产生摩尔条纹(MFs)。然而,人们对这些图案如何在扫描透射电子显微镜(STEM)中形成的了解仍然有限。在此,我们扩展了双散射模型,建立了双层样品在 STEM 中的 MFs 成像理论,并应用该理论成功解释了包晶 PbZrO3/SrTiO3 系统的实验和模拟 STEM 图像。我们的研究结果表明,应考虑到电子从第 1 层流出的波矢量及其与第 2 层原子柱的相对位置。随着散射角的增大,原子柱错位导致二次散射光束的强度比单散射光束的强度降低得更快。因此,明场 (BF)-STEM 中的中频强度分布仍可描述为两个单原子图像的乘积。然而,在高角度环形暗场 (HAADF) -STEM 中,它近似描述为两个图像的叠加。我们的工作不仅填补了非相干成像中 MF 的知识空白,还强调了在分析 HAADF-STEM 成像时,受真实空间限制的相干散射的重要性。
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Moiré fringe imaging of heterostructures by scanning transmission electron microscopy

A heterostructured crystalline bilayer specimen is known to produce moiré fringes (MFs) in the conventional transmission electron microscopy (TEM). However, the understanding of how these patterns form in scanning transmission electron microscopy (STEM) remains limited. Here, we extended the double-scattering model to establish the imaging theory of MFs in STEM for a bilayer sample and applied this theory to successfully explain both experimental and simulated STEM images of a perovskite PbZrO3/SrTiO3 system. Our findings demonstrated that the wave vectors of electrons exiting from Layer-1 and their relative positions with the atomic columns of Layer-2 should be taken into account. The atomic column misalignment leads to a faster reduction in the intensity of the secondary scattering beam compared to the single scattering beam as the scattering angle increases. Consequently, the intensity distribution of MFs in the bright field (BF)-STEM can be still described as the product of two single atomic images. However, in high angle annular dark field (HAADF)-STEM, it is approximately described as the superposition of the two images. Our work not only fills a knowledge gap of MFs in incoherent imaging, but also emphasizes the importance of the coherent scattering restricted by the real space when analyzing the HAADF-STEM imaging.

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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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