基于钯栅电极的氢气传感 SOI 无结 FET 研究

IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Microelectronics Journal Pub Date : 2024-07-18 DOI:10.1016/j.mejo.2024.106312
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引用次数: 0

摘要

本研究全面考察了基于钯(Pd)栅极电极的绝缘体上硅(SOI)无结场效应晶体管(JLFET),用于氢气(H2)传感(Pd-SOI-JLFET)。该器件的栅极电介质叠层由二氧化硅(SiO2)和二氧化铪(HfO2)组成。通过检查漏极电流 (IDS)、跨导 (gm)、输出电导 (gd)、能带图 (E)、栅极至源极电容 (CGS) 和表面电位 (Φs)等若干电气特性,对检测和识别氢气的存在进行了广泛的分析。此外,还进行了一项全面调查,以研究 H2 气体的存在和温度变化对与短沟道效应 (SCE) 相关的重要参数的影响,包括关态电流 (IOFF)、导通电流 (ION)、阈下摆动 (SS) 和阈值电压 (Vth)。此外,还通过考虑工艺变化效应对关态电流 (IOFF) 进行了灵敏度分析。还计算了在不同温度下检测氢气分子的灵敏度。在温度为 300K 时,压力值分别为 10-14 Torr、10-13 Torr、10-12 Torr、10-11 Torr 和 10-10 Torr 时,灵敏度值分别为 1.50083、3.21754、27.71483、152.39617 和 2052.8。这项分析对钯-SOI-JLFET 氢气传感器的性能和功效进行了全面检查,凸显了其在广泛的氢气传感应用中的潜力。
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Investigation on palladium gate electrode-based SOI junctionless FET for hydrogen gas sensing

This study provides a comprehensive investigation on palladium (Pd) gate electrode-based silicon on insulator (SOI) junctionless field-effect transistor (JLFET) for hydrogen gas (H2) sensing (Pd–SOI-JLFET). The device has a gate dielectric stack consisting of silicon dioxide (SiO2) and hafnium dioxide (HfO2). An extensive analysis was conducted to detect and identify the presence of hydrogen gas by examining several electrical characteristics such as drain current (IDS), transconductance (gm), output conductance (gd), energy band diagram (E), gate-to-source capacitance (CGS), and surface potential (Φs). Furthermore, a comprehensive investigation was conducted to examine the impact of the presence of H2 gas and variations in temperature on important parameters associated with the short channel effects (SCEs) including off-state current (IOFF), on-state current (ION), subthreshold swing (SS) and threshold voltage (Vth). In addition, the sensitivity analysis of the off-state current (IOFF) by considering process variation effect has been done. Sensitivity is also calculated at various temperatures for the detection of hydrogen gas molecule. At the temperature of 300K, the sensitivity values were obtained as 1.50083, 3.21754, 27.71483, 152.39617 and 2052.8 for pressure values 10−14 Torr, 10−13 Torr, 10−12 Torr, 10−11 Torr and 10−10 Torr, respectively. This analysis provides a thorough examination of the performance and efficacy of the Pd–SOI-JLFET hydrogen gas sensor highlighting its potential for a wide range of hydrogen sensing applications.

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来源期刊
Microelectronics Journal
Microelectronics Journal 工程技术-工程:电子与电气
CiteScore
4.00
自引率
27.30%
发文量
222
审稿时长
43 days
期刊介绍: Published since 1969, the Microelectronics Journal is an international forum for the dissemination of research and applications of microelectronic systems, circuits, and emerging technologies. Papers published in the Microelectronics Journal have undergone peer review to ensure originality, relevance, and timeliness. The journal thus provides a worldwide, regular, and comprehensive update on microelectronic circuits and systems. The Microelectronics Journal invites papers describing significant research and applications in all of the areas listed below. Comprehensive review/survey papers covering recent developments will also be considered. The Microelectronics Journal covers circuits and systems. This topic includes but is not limited to: Analog, digital, mixed, and RF circuits and related design methodologies; Logic, architectural, and system level synthesis; Testing, design for testability, built-in self-test; Area, power, and thermal analysis and design; Mixed-domain simulation and design; Embedded systems; Non-von Neumann computing and related technologies and circuits; Design and test of high complexity systems integration; SoC, NoC, SIP, and NIP design and test; 3-D integration design and analysis; Emerging device technologies and circuits, such as FinFETs, SETs, spintronics, SFQ, MTJ, etc. Application aspects such as signal and image processing including circuits for cryptography, sensors, and actuators including sensor networks, reliability and quality issues, and economic models are also welcome.
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